Optical Proximity Correction With Linear Regression
نویسندگان
چکیده
منابع مشابه
Optical Proximity Correction with Principal Component Regression
An important step in today’s Integrated Circuit (IC) manufacturing is optical proximity correction (OPC). In model based OPC, masks are systematically modified to compensate for the non-ideal optical and process effects of optical lithography system. The polygons in the layout are fragmented, and simulations are performed to determine the image intensity pattern on the wafer. Then the mask is p...
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ژورنال
عنوان ژورنال: IEEE Transactions on Semiconductor Manufacturing
سال: 2008
ISSN: 0894-6507
DOI: 10.1109/tsm.2008.2000283